Multiple Frequency Analysis of Capacitively Coupled RF Plasma


HELHEL S., ÖKSÜZ L.

ELECO 2005, Turkey, 1 - 04 December 2005, vol.1, no.1, pp.1

  • Publication Type: Conference Paper / Full Text
  • Volume: 1
  • Country: Turkey
  • Page Numbers: pp.1
  • Akdeniz University Affiliated: No

Abstract

Homogeneous Hydrogen plasma discharge driven by two 
sinusoidal current sources has been analyzed. Two RF 
sources, operating at 27.12MHz and 1.94MHz respectively, 
are generally coupled to each other through the plasma 
medium. We assumed time independent and collisionless 
ion motion that gave us the analytic expressions for 
discharge parameters as a function of frequency, current 
and voltage. As a consequence, we have proposed that for 
conventional CCRF plasma generated by driving one 
electrode with a single RF power source can be improved by 
finding the optimal characteristics for the discharge 
operation or by introducing a secondary RF source. The 
ratio of main RF source power to secondary RF source 
power can be controlled for plasma density and plasma 
uniformity.