JOURNAL OF NON-CRYSTALLINE SOLIDS, cilt.357, sa.1, ss.206-210, 2011 (SCI-Expanded)
This paper describes the preparation and characterization of ZrO2 thin films deposited on silicon wafer by spin coating method. Nanocrystalline ZrO2 was synthesized by hydrothermal method using zirconium (IV)-n-propoxide as a precursor material. Surface of the ZrO2 particles was then modified with 2-acetoacetoxyethyl methacrylate used as a copolymer for coatings. The optical properties, nanostructure and surface morphology of the thin films prepared from surface modified ZrO2 nanoparticles were examined by optical spectroscopy, X-ray diffraction and scanning electron microscopy, respectively. It was found that the films deposited on silicon wafer have crystalline structure of monoclinic (111) at temperature of 150 degrees C. It was observed that films depict very dense material that does not present any granular or columnar structure. It was found that optical transparency of thin ZrO2 films distributed in the range of 30-40 percent in the spectral range 400-800 nm. Refractive index of ZrO2 films were determined as functions of ZrO2 content and it was found that the refractive index increases from 1.547 to 1.643 with increased ZrO2 content. (C) 2010 Elsevier B.V. All rights reserved.