Journal of Sol-Gel Science and Technology, cilt.59, sa.1, ss.153-157, 2011 (SCI-Expanded)
This study describes the In2S3 semiconductor thin film coating on glass substrate by sol-gel method. The In2S 3 thin film samples were prepared and examined by the X-ray diffraction (XRD), the UV-visible optical absorption and transmission study, and the Scanning Electron Microscope (SEM) image analyses. The XRD analysis results show that the In2S3 semiconductor thin films prepared by sol-gel method is formed at T~360-520 °C temperature interval. Band gap energy and optical absorption spectrum analysis of the In2S 3 thin films reveal that Eg~2.51 eV for the In2S 3 thin films. According to the EDX result the film was In-rich with the In/S = 1.42 ratio. The thickness of prepared In2S3 layer is about 400 nm. © 2011 Springer Science+Business Media, LLC.